Patterning at the 10 nanometer length scale using a strongly segregating block copolymer thin film and vapor phase infiltration of inorganic precursors

TitlePatterning at the 10 nanometer length scale using a strongly segregating block copolymer thin film and vapor phase infiltration of inorganic precursors
Publication TypeJournal Article
Year of Publication2016
AuthorsChoi, JW, Li, ZD, Black, CT, Sweat, DP, Wang, XD, Gopalan, P
JournalNanoscale
Volume8
Pagination11595-11601
ISBN Number2040-3364
DOI10.1039/c6nr01409g