Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists

TitleControl of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists
Publication TypeJournal Article
Year of Publication2009
AuthorsKang, H, Kim, YJun, Gopalan, P, Nealey, PF
JournalJournal of Vacuum Science & Technology B
Volume27
Pagination2993-2997
Date PublishedNov
Accession NumberISI:000272803400134