All Department Publications

Found 4 results
Author Title Type [ Year(Asc)]
Filters: Author is Leolukman, Melvina  [Clear All Filters]
2010
Han E, Leolukman M, Kim M, Gopalan P. Resist free patterning of nonpreferential buffer layers for block copolymer lithography. ACS Nano. 2010;4(11):6527-34.
2009
Hirai T, Leolukman M, Jin S, Goseki R, Ishida Y, Kakimoto M-aki, Hayakawa T, Ree M, Gopalan P. Hierarchical Self-Assembled Structures from POSS-Containing Block Copolymers Synthesized by Living Anionic Polymerization. Macromolecules [Internet]. 2009;42:8835-8843. Available from: http://pubs.acs.org/doi/abs/10.1021/ma9018944
Hirai T, Leolukman M, Liu CC, Han E, Kim YJ, Ishida Y, Hayakawa T, Kakimoto M-aki, Nealey PF, Gopalan P. One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. Advanced Materials. 2009;21:4334-+.
2007
La Y-H, Park S-M, Meagley RP, Leolukman M, Gopalan P, Nealey PF. Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness. Journal of Vacuum Science & Technology B. 2007;25:2508-2513.

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