All Department Publications

Found 10 results
Author Title Type [ Year(Asc)]
Filters: Author is Nealey, Paul F.  [Clear All Filters]
2011
Liu C-C, Han E, Onses SM, Thode CJ, Ji S, Gopalan P, Nealey PF. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats. Macromolecules. 2011;44:1876-1885.
2010
Han E, Kang H, Liu C-C, Nealey PF, Gopalan P. Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates. Adv Mater. 2010;22(38):4325-9.
Liu C-C, Nealey PF, Raub AK, Hakeem PJ, Brueck SRJ, Han E, Gopalan P. Integration of block copolymer directed assembly with 193 immersion lithography. Journal of Vacuum Science & Technology B. 2010;28:C6B30-C6B34.
Kang H, Detcheverry F, Stuen KO, Craig GSW, De Pablo JJ, Gopalan P, Nealey PF. Shape control and density multiplication of cylinder-forming ternary block copolymer-homopolymer blend thin films on chemical patterns. Journal of Vacuum Science & Technology B. 2010;28:C6B24-C6B29.
2009
Kang H, Kim YJ, Gopalan P, Nealey PF. Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists. Journal of Vacuum Science & Technology B. 2009;27:2993-2997.
Hirai T, Leolukman M, Liu CC, Han E, Kim YJ, Ishida Y, Hayakawa T, Kakimoto M-aki, Nealey PF, Gopalan P. One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. Advanced Materials. 2009;21:4334-+.
2008
Kang H, Detcheverry FA, Mangham AN, Stoykovich MP, Daoulas KC, Hamers RJ, Mueller M, De Pablo JJ, Nealey PF. Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites. Physical Review Letters. 2008;100.
2007
Kang H, Mangham AN, Stoykovich MP, Hamers RJ, Nealey PF. Fabrication of nanoparticle arrays using directed assembly of block copolymers. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry). 2007;48:886-887.
Han E, In I, Park S-M, La Y-H, Wang Y, Nealey PF, Gopalan P. Photopatternable imaging layers for controlling mock copolymer microdomain orientation. Advanced Materials. 2007;19:4448-+.
La Y-H, Park S-M, Meagley RP, Leolukman M, Gopalan P, Nealey PF. Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness. Journal of Vacuum Science & Technology B. 2007;25:2508-2513.

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