All Department Publications

Found 8 results
Author Title Type [ Year(Asc)]
Filters: Author is Han, Eungnak  [Clear All Filters]
2011
Liu C-C, Han E, Onses SM, Thode CJ, Ji S, Gopalan P, Nealey PF. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats. Macromolecules. 2011;44:1876-1885.
2010
Han E, Gopalan P. Cross-linked random copolymer mats as ultrathin nonpreferential layers for block copolymer self-assembly. Langmuir. 2010;26(2):1311-5.
Kim M, Safron NS, Han E, Arnold MS, Gopalan P. Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials. Nano Letters. 2010;10:1125-1131.
Han E, Kang H, Liu C-C, Nealey PF, Gopalan P. Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates. Adv Mater. 2010;22(38):4325-9.
Liu C-C, Nealey PF, Raub AK, Hakeem PJ, Brueck SRJ, Han E, Gopalan P. Integration of block copolymer directed assembly with 193 immersion lithography. Journal of Vacuum Science & Technology B. 2010;28:C6B30-C6B34.
Han E, Leolukman M, Kim M, Gopalan P. Resist free patterning of nonpreferential buffer layers for block copolymer lithography. ACS Nano. 2010;4(11):6527-34.
2009
Hirai T, Leolukman M, Liu CC, Han E, Kim YJ, Ishida Y, Hayakawa T, Kakimoto M-aki, Nealey PF, Gopalan P. One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. Advanced Materials. 2009;21:4334-+.
2007
Han E, In I, Park S-M, La Y-H, Wang Y, Nealey PF, Gopalan P. Photopatternable imaging layers for controlling mock copolymer microdomain orientation. Advanced Materials. 2007;19:4448-+.

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