All Faculty and Research Staff Publications

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Jackson DHK, Laskar MR, Fang S, Xu S, Ellis RG, Li X, Dreibelbis M, Babcock SE, Mahanthappa MK, Morgan D, et al. Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and FilmsJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2016 ;34.
Jackson DHK, Laskar MR, Fang SY, Xu SZ, Ellis RG, Li XQ, Dreibelbis M, Babcock SE, Mahanthappa MK, Morgan D, et al. Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes. Journal of Vacuum Science & Technology A. 2016 ;34.
Jackson DHK, Laskar MR, Fang SY, Xu SZ, Ellis RG, Li XQ, Dreibelbis M, Babcock SE, Mahanthappa MK, Morgan D, et al. Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes. Journal of Vacuum Science & Technology A. 2016 ;34.
Jackson DHK, O'Neill BJ, Lee J, Huber GW, Dumesic JA, Kuech TF. Tuning Acid-Base Properties Using Mg-Al Oxide Atomic Layer Deposition. ACS Applied Materials & Interfaces. 2015 ;7:16573-16580.
Jackson DHK, Wang D, Gallo JMR, Crisci AJ, Scott SL, Dumesic JA, Kuech TF. Amine Catalyzed Atomic Layer Deposition of (3-Mercaptopropyl)trimethoxysilane for the Production of Heterogeneous Sulfonic Acid Catalysts. Chemistry of Materials. 2013 ;25:3844-3851.
Jackson DHK, Dunn BA, Guan YX, Kuech TF. Tungsten hexacarbonyl and hydrogen peroxide as precursors for the growth of tungsten oxide thin films on titania nanoparticles. AIChE Journal. 2014 ;60:1278-1286.