| Title | Synthesis of Photoacid Generator-Containing Patternable Diblock Copolymers by Reversible Addition-Fragmentation Transfer Polymerization |
| Publication Type | Journal Article |
| Year of Publication | 2009 |
| Authors | Kim, YJ, Kang, HM, Leolukman, M, Nealey, PF, Gopalan, P |
| Journal | Chemistry of Materials |
| Volume | 21 |
| Pagination | 3030-3032 |
| Date Published | Jul |
| Accession Number | ISI:000268174400002 |
| Keywords | blends, block-copolymers, Chemically amplified resists, chemistry, Chemistry, Physical, lithography, Materials Science, Multidisciplinary, radical polymerization, raft process, thin-films |
| Short Title | Chem. Mat |