Passivation and activation: How do monovalent atoms modify the reactivity of silicon surfaces? A perspective on the article, "The mechanism of amine formation on Si(100) activated with chlorine atoms", by C. C. Finstad, A.D. Thorsness, and A.J. Muscat

TitlePassivation and activation: How do monovalent atoms modify the reactivity of silicon surfaces? A perspective on the article, "The mechanism of amine formation on Si(100) activated with chlorine atoms", by C. C. Finstad, A.D. Thorsness, and A.J. Muscat
Publication TypeJournal Article
Year of Publication2006
AuthorsHamers, RJ
JournalSurface Science
Volume600
Pagination3361
Date PublishedSep
Accession NumberISI:000240893300001