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One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers
Tue, 11/27/2012 - 11:24am — root
| Title | One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers |
| Publication Type | Journal Article |
| Year of Publication | 2009 |
| Authors | Hirai, T, Leolukman, M, Liu, CC, Han, E, Kim, YJ, Ishida, Y, Hayakawa, T, Kakimoto, M-aki, Nealey, PF, Gopalan, P |
| Journal | Advanced Materials |
| Volume | 21 |
| Pagination | 4334-+ |
| Date Published | Nov |
| Accession Number | ISI:000272504300003 |
| Keywords | Chemistry, Multidisciplinary, Chemistry, Physical, fabrication, lithography, Materials Science, Multidisciplinary, media, Nanoscience &, Nanotechnology, nm, Physics, Applied, Physics, Condensed Matter, resists, thin-films |
| Abstract | We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by single-step, highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm. |
| Short Title | Adv. Mater |
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